@phdthesis{Danilov2014, author = {Vladimir Danilov}, title = {Plasma Modification of Polydimethylsiloxane in a hydrogen CCRF low-pressure discharge}, journal = {Plasmamodifizierung von Polydimethylsiloxan in einer CCRF-Niederdruckentladung in Wasserstoff}, url = {https://nbn-resolving.org/urn:nbn:de:gbv:9-001686-5}, year = {2014}, abstract = {The development of innovative coatings with multifunctional properties is an ambitious task in modification of material surfaces. A novel approach is a hybrid method combining the non-thermal plasma processing with nanotechnology for the development of multifunctional surface coatings. The conception of the hybrid coating process is based on three steps: the preparation of a suspension consisting of an organic liquid and functional nanoparticles, the deposition of the suspension as a thin liquid film on the material surface, and the plasma modification of the liquid organic film to achieve a thin solid composite film with embedded nanoparticles demonstrating multifunctional properties and good adherence on the substrate material. In this work the liquid polydimethylsiloxane (PDMS) was applied as a model system, and the experimental investigations were focused on the PDMS plasma modification. In particular, the specific role of the different plasma components and the influence of the plasma and processing parameters on the PDMS modification were studied. The applied capacitively coupled radio frequency (CCRF) plasma was analyzed by electric probe measurements and optical emission spectroscopy, whereas the molecular changes in PDMS due to plasma-induced chemical reactions were studied by the Fourier transform infrared reflection absorption spectroscopy. Additionally, the photocatalytic activity of thin composite films consisting of plasma cross-linked PDMS with embedded TiO2 nanoparticles was demonstrated. During the investigation it was found that the CCRF discharge modifies efficiently thin liquid PDMS films to solid coatings. The samples were positioned in the plasma bulk at floating potential. The penetration depth of particles like neutrals, ions, electrons and radicals in the film is strongly limited. The heating of samples in the CCRF discharge is weak to modify PDMS by itself and only the plasma radiation is able to transform the liquid bulk to solid one. It is known that the absorption onset of PDMS lies in the VUV region (below 200 nm). The energetic VUV radiation penetrates into the PDMS film on a thickness from several hundred nanometers to few micrometers and initiates photochemical reactions there. Thus, different gases like Ar, Xe, O2, H2O, air and H2 were tested to provide the strongest VUV emission intensity of the CCRF discharge. Discharge pressure and power were varied for all these gases and it was found that at all conditions the H2 plasma demonstrates drastically stronger emission. Thus, H2 gas was selected for the plasma treatment of liquid PDMS films. The IRRAS analysis revealed the transformation process of PDMS with the degradation of CH3 groups, the formation of new groups like SiOH, CH2 and SiH, the formation of the SiOx material and crosslinking. It was found that the modification effect is not uniform across the film thickness. The top region with an initial thickness up to 100 nm loses all CH3 groups, in the underlying region the CH3 concentration increases gradually from zero to the value for PDMS, if the film was thick enough. The methyl-free SiOx top layer contains also SiOH and SiH groups. Furthermore, the SiH groups are concentrated only in a very thin layer with a thickness below 10 nm. The presence of the unscreened polar SiOSi and SiOH groups on the surface causes the adsorption of H2O from the atmosphere, which was also observed by IRRAS. By means of the spectroscopic ellipsometry it was found out that all above described regions experience a shrinking. The reason is the crosslinking and loss of material. The most shrunken layer is the top SiOx layer with the shrinking ratio (final thickness/initial thickness) of 0.55 - 0.60. Further, this ratio gradually rise up to the value of 0.95 in the deeper region, which has the concentration of CH3 groups of about that for PDMS. After the analysis of all results the depth of effective modification was estimated at 300 400 nm for the most optimal conditions. The optimization of the plasma VUV intensity was realized by variation of discharge pressure and power. The strongest plasma emission at studied conditions provided the irradiance of the sample of ca. 13 mW/cm2. However, such strong radiation causes very strong production rate of the gases. These products leave the modifying film slower as they are produced, what causes their accumulation in there. Their pressure grows up leading to formation of bubbles, which later explode. Finally, the film becomes heavily damaged. To avoid this effect the pressure and the RF power were changed to reduce the irradiance to 6 - 7 mW/cm2. This resulted in the absence of any damages.}, language = {en} }