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Bitte verwenden Sie diesen Link, wenn Sie dieses Dokument zitieren oder verlinken wollen: https://nbn-resolving.org/urn:nbn:de:gbv:9-opus-59481

Treatment of Candida albicans biofilms with low-temperature plasma induced by dielectric barrier discharge and atmospheric pressure plasma jet

  • Because of some disadvantages of chemical disinfection in dental practice (especially denture cleaning), we investigated the effects of physical methods on Candida albicans biofilms. For this purpose, the antifungal efficacy of three different low-temperature plasma devices (an atmospheric pressure plasma jet and two different dielectric barrier discharges (DBDs)) on Candida albicans biofilms grown on titanium discs in vitro was investigated. As positive treatment controls, we used 0.1% chlorhexidine digluconate (CHX) and 0.6% sodium hypochlorite (NaOCl). The corresponding gas streams without plasma ignition served as negative treatment controls. The efficacy of the plasma treatment was determined evaluating the number of colony-forming units (CFU) recovered from titanium discs. The plasma treatment reduced the CFU significantly compared to chemical disinfectants. While 10 min CHX or NaOCl exposure led to a CFU log10 reduction factor of 1.5, the log10 reduction factor of DBD plasma was up to 5. In conclusion, the use of low-temperature plasma is a promising physical alternative to chemical antiseptics for dental practice.

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Metadaten
Author: Ina Koban, Rutger Matthes, Nils-Olaf Hübner, Alexander Welk, Peter Meisel, Birte Holtfreter, Rabea Sietmann, Eckhard Kindel, Klaus-Dieter Weltmann, Axel Kramer, Thomas KocherORCiD
URN:urn:nbn:de:gbv:9-opus-59481
DOI:https://doi.org/10.1088/1367-2630/12/7/073039
ISSN:1367-2630
Parent Title (English):New Journal of Physics
Publisher:IOP Publishing
Place of publication:Bristol
Document Type:Article
Language:English
Date of first Publication:2010/07/27
Release Date:2022/11/11
Volume:12
Article Number:073039
Page Number:16
Faculties:Universitätsmedizin / Poliklinik für Zahnerhaltung, Parodontologie und Endodontologie
Licence (German):License LogoCreative Commons - Namensnennung