Pulse length dependence of a reactive high power impulse magnetron (HiPIMS) discharge

The pulse length dependence of a reactive high power impulse magnetron sputtering (HiPIMS) discharge with a tungsten cathode in an argon+oxygen gas mixture gas was investigated. The HiPIMS discharge is operated with a variable pulse length of 20–500 µs. Discharge current measurements, optical emission spectroscopy of neutral Ar, O, and W lines, and energy-resolved ion mass spectrometry are employed. A pronounced dependence of the discharge current on pulse length is noted while the initial discharge voltage is maintained constant. Energy-resolved mass spectrometry shows that the oxygen-to-tungsten (O+/W+) and the tungsten oxide-to-tungsten (WO+/W+) ion ratio decreases with pulse length due to target cleaning. Simulation results employing the SDTrimSP program show the formation of a non-stoichiometric sub-surface compound layer of oxygen which depends on the impinging ion composition and thus on the pulse length.

Metadaten
Author:	Rainer Hippler, Martin Cada, Andreas Mutzke, Zdenek Hubicka
URN:	urn:nbn:de:gbv:9-opus-109599
DOI:	https://doi.org/10.1088/1361-6595/acd5fc
ISSN:	1361-6595
Parent Title (English):	Plasma Sources Science and Technology
Publisher:	IOP Publishing
Place of publication:	Bristol
Document Type:	Article
Language:	English
Date of first Publication:	2023/06/02
Release Date:	2024/04/09
Tag:	high power impulse magnetron sputtering; ion composition; optical emission spectroscopy; pulse length dependence; reactive mode
Volume:	32
Issue:	5
Article Number:	055013
Page Number:	12
Faculties:	Mathematisch-Naturwissenschaftliche Fakultät / Institut für Physik
Collections:	weitere DFG-förderfähige Artikel
Licence (German):	Creative Commons - Namensnennung 4.0 International

Open Access