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The development of innovative coatings with multifunctional properties is an ambitious task in modification of material surfaces. A novel approach is a hybrid method combining the non-thermal plasma processing with nanotechnology for the development of multifunctional surface coatings. The conception of the hybrid coating process is based on three steps: the preparation of a suspension consisting of an organic liquid and functional nanoparticles, the deposition of the suspension as a thin liquid film on the material surface, and the plasma modification of the liquid organic film to achieve a thin solid composite film with embedded nanoparticles demonstrating multifunctional properties and good adherence on the substrate material. In this work the liquid polydimethylsiloxane (PDMS) was applied as a model system, and the experimental investigations were focused on the PDMS plasma modification. In particular, the specific role of the different plasma components and the influence of the plasma and processing parameters on the PDMS modification were studied. The applied capacitively coupled radio frequency (CCRF) plasma was analyzed by electric probe measurements and optical emission spectroscopy, whereas the molecular changes in PDMS due to plasma-induced chemical reactions were studied by the Fourier transform infrared reflection absorption spectroscopy. Additionally, the photocatalytic activity of thin composite films consisting of plasma cross-linked PDMS with embedded TiO2 nanoparticles was demonstrated. During the investigation it was found that the CCRF discharge modifies efficiently thin liquid PDMS films to solid coatings. The samples were positioned in the plasma bulk at floating potential. The penetration depth of particles like neutrals, ions, electrons and radicals in the film is strongly limited. The heating of samples in the CCRF discharge is weak to modify PDMS by itself and only the plasma radiation is able to transform the liquid bulk to solid one. It is known that the absorption onset of PDMS lies in the VUV region (below 200 nm). The energetic VUV radiation penetrates into the PDMS film on a thickness from several hundred nanometers to few micrometers and initiates photochemical reactions there. Thus, different gases like Ar, Xe, O2, H2O, air and H2 were tested to provide the strongest VUV emission intensity of the CCRF discharge. Discharge pressure and power were varied for all these gases and it was found that at all conditions the H2 plasma demonstrates drastically stronger emission. Thus, H2 gas was selected for the plasma treatment of liquid PDMS films. The IRRAS analysis revealed the transformation process of PDMS with the degradation of CH3 groups, the formation of new groups like SiOH, CH2 and SiH, the formation of the SiOx material and crosslinking. It was found that the modification effect is not uniform across the film thickness. The top region with an initial thickness up to 100 nm loses all CH3 groups, in the underlying region the CH3 concentration increases gradually from zero to the value for PDMS, if the film was thick enough. The methyl-free SiOx top layer contains also SiOH and SiH groups. Furthermore, the SiH groups are concentrated only in a very thin layer with a thickness below 10 nm. The presence of the unscreened polar SiOSi and SiOH groups on the surface causes the adsorption of H2O from the atmosphere, which was also observed by IRRAS. By means of the spectroscopic ellipsometry it was found out that all above described regions experience a shrinking. The reason is the crosslinking and loss of material. The most shrunken layer is the top SiOx layer with the shrinking ratio (final thickness/initial thickness) of 0.55 - 0.60. Further, this ratio gradually rise up to the value of 0.95 in the deeper region, which has the concentration of CH3 groups of about that for PDMS. After the analysis of all results the depth of effective modification was estimated at 300 400 nm for the most optimal conditions. The optimization of the plasma VUV intensity was realized by variation of discharge pressure and power. The strongest plasma emission at studied conditions provided the irradiance of the sample of ca. 13 mW/cm2. However, such strong radiation causes very strong production rate of the gases. These products leave the modifying film slower as they are produced, what causes their accumulation in there. Their pressure grows up leading to formation of bubbles, which later explode. Finally, the film becomes heavily damaged. To avoid this effect the pressure and the RF power were changed to reduce the irradiance to 6 - 7 mW/cm2. This resulted in the absence of any damages.
In the framework of the current work has been the plasma initiated and surface catalysed species conversion studied in low pressure and atmospheric plasmas. The aim of the work is to improve the understanding of the internal processes in order to increase the energy efficiency as well as the selectivity of the reaction products of future plasma devices. Beside many technical applications of plasmas, air purification shows great potential. Over the last decades, plasma based pollution control has proofed its ability to remove harmful contaminants or annoying odours from an air stream. However, the energy efficiency and the selectivity of the products are a remaining challenge.
Motivated by these issues, a multi stage packed-bed reactor has been used to remove admixed ethylene and toluene from an air stream. It has been found that the maximum toluene destruction has been 60%, whereas ethylene has been nearly completely removed. The specific energy β has been between 120 and 1600 JL-1. Fourier Transform Infrared spectroscopy, FTIR spectroscopy, has been used to identify and quantify the species H2O, CO2, CO, O3, HNO3, HCN, CH2O, CH2O2, N2O and NO2. However, none of these experiments led to the detection of NO.
The embedment of packing material into a plasma volume leads to increased surface effects. In order to study them, the inner side of a tube reactor, made of Pyrex, served as the surface under study and has been exposed to a rf plasma for 1h. The surface effects of the plasma treatment have been investigated indirectly by studying the oxidation of NO into NO2. After the plasma exposure, the reactor has been evacuated and filled with a gas mixture of 1% NO in N2 / Ar. Both species have been measured using quantum cascade laser absorption spectroscopy, QCLAS. It has been found that, using oxygen containing plasmas, the NO concentration decreased whereas the NO2 concentration increased. Therefore, oxygen containing plasmas are able to deposit oxygen on the surface. The filling with NO leads to the oxidation via the Eley-Rideal mechanism. A simplified model calculation supports these assumptions.
For a more comfortable application of the QCLAS, a compact multi channel spectrometer has been developed, TRIPLE Q. It combines the high time resolution with the possibility to measure the concentration of at least three infrared active species simultaneously. Due to the high time resolution, a huge number of spectra have to be analysed. In order to calculate absolute number densities, an algorithm has been developed which automatically treats typical phenomena like pulse jitter, rapid passage effect or variations of the intensity of the laser pulses.
The gas temperature is an important parameter in plasma physics. Using the TRIPLE Q system, the gas temperature has been determined for pulsed dc plasmas. For this case, NO has been used as a probe gas. From the spectra, the temperature has been calculated using the line ratio method. The relative intensity of the absorption structures of NO at 1900.5cm-1 and 1900.08cm-1 depend on the temperature. Therefore, the ratio has been used to calculate the gas temperature with a time resolution in the μs range.
Vibrationally excited nitrogen can be an energy reservoir that plays an important role in plasma chemistry. In N2 / N2O plasmas, vibrationally excited N2 can undergo relaxation via a resonant vibration vibration coupling between vibrationally excited N2 and N2O. Due to such an efficient energy transfer, the method allows one to study the relaxation of vibrationally excited N2. Using this method, molecules, which are not infrared active, can be monitored. This approach has extended the field of scientific and commercial applications of the QCLAS.
Die vorliegende Arbeit widmet sich der plasmachemischen Herstellung und physikalisch-chemischen Charakterisierung von dünnen organischen Schichten auf der Basis von Ethylenglykol (Präkursor). Die Oberflächen können die Adsorption von Proteinen minimieren und daher als neues biokompatibles Material getestet werden. Im Schwerpunkt der Arbeit liegt die Entwicklung eines plasmachemischen RF-Reaktors (genannt Nevada) und einer innovativen Beschichtungstechnologie TFPD (Temperature Forced Plasma Deposition) als Erweiterung der PECVD (Plasma Enhanced Chemical Vapour Deposition). Ein Gemisch aus Ethylenglykol und Argon wurde als Modellsystem untersucht. Die Plasmabedingungen und die Oberflächentemperatur wurden optimiert und an Phaseneigenschaften von Ethylenglykol angepasst. Die komplexe Polykondensation steht für die plasmagestützte Umwandlung der Kondensatschicht zu einem stabilen Poly(Ethylenglykol)-ähnlichen Plasmapolymer. Der Prozess wurde durch die simultane Temperaturkontrolle und in situ FTIR-Spektroskopie analysiert. Zur Untersuchung der erzeugten Proben wurden weitere ex situ Oberflächenanalysen wie XPS, AFM, TDS, MALDI, XRD und die optische Ellipsometrie verwendet. Durch die neue Methode TFPD entstehen extrem glatte, amorphe und wasserunlösliche Schichten mit einem Potenzial für die Biokompatibilität.