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Asymmetrical capacitively coupled RF discharges in oxygen, argon and hydrogen have been experimentally investigated with the innovative technique of the phase resolved optical emission spectroscopy. This diagnostic tool allows to measure spatio-temporally resolved emission intensities of electronically excited species with a high resolution. The spatial (axial) resolution was better than 1 mm and a temporal resolution of about 1.5 ns has been achieved. Therefore the plasma induced optical emission within the RF cycle (TRF = 73.75 ns) from the RF sheath region with a typical mean sheath thickness of about 5mm has been studied. Spatio-temporally resolved optical emission patterns of the following optical transitions have been measured for a total gas pressure in the range of 20 to 100 Pa and self-bias voltages between -50 and -550 V: Oxygen plasma Emission at 777.4 nm and 844.6 nm (atomic oxygen) Argon plasma Emission at about 751 nm and 841 nm (argon) Hydrogen plasma Emission at 656.3nm (atomic hydrogen, H alpha-line) These transitions are the most prominent ones of the investigated excited species in these plasmas as could be shown from overview spectra of the plasma induced optical emission in the range from 350 to 850 nm. For the first time such extensive PROES measurements in oxygen CCRF plasmas are presented in this work. The additional investigations of argon and hydrogen plasmas serve as a reference and for a direct comparison with results from the literature. The temporal behavior of the emission intensity is influenced by the effective lifetime of the emitting states which is on the order of the nanosecond time scale of the RF cycle. Therefore, it does not represent the real temporal behavior of the excitation. A simple method has been applied to calculate relative excitation rates from the measured emission intensities to distinguish different excitation mechanisms and their correct relative temporal behavior. In a close collaboration within the framework of the Sonderforschungsbereich Transregio 24 'Fundamentals of Complex Plasmas' a newly 1d3v PIC-MCC code for simulations of capacitive RF discharges in oxygen has been developed by Matyash et al. The very close coupling of experiment and modeling allowed a really detailed and microscopic understanding of the processes and dynamics from the sheath to the bulk plasma in CCRF discharges. The spatio-temporally resolved excitation rate profiles show four different excitation structures (I-IV). Excitation processes due to the following mechanisms in CCPs could be identified and characterized: I Electrons expelled from growing sheath II Electrons detached from negative ions (collisions with neutrals) + secondary electrons from the electrode surface (ion bombardment) III Field-reversal effect, reduced mobility of electrons (electron-neutral collisions) IV Heavy-particle collisions These excitation mechanisms are characterized by different temporal and spatial behaviors of the excitation rate within the RF cycle. Additionally it has been shown that the excitation by electron impact in the investigated oxygen plasmas results mainly from dissociative electron impact excitation (O2 + e -> O + O* + e) and not from direct electron impact excitation (O + e -> O* + e). Actinometry measurements show that the results are not really credible. Thus actinometry is not applicable on the investigated oxygen RF plasma. A challenge in interpretation is the observed excitation pattern IV. Pattern IV has to be caused in connection with heavy particle collisions nearby the electrode surface and could be observed in all the three plasmas oxygen, argon and hydrogen. It is located directly in front of the powered electrode and appears during almost the whole RF cycle. The temporal modulation is nearly sinusoidal and weak in comparison to the first three patterns. This is due to the weak RF modulation of the ion flux towards the electrode surface which has been proven by a PIC simulation. It could be shown that the modulation degree of pattern IV depends on the transition time of the corresponding positive ions through the RF sheath which is influenced by the ion mass. In oxygen as well as in argon CCRF plasmas pattern IV is less modulated than in hydrogen CCRF plasmas due to the heavier ions in oxygen and argon. Additionally the modulation degree increases with increasing pressure due to the more confined plasma at higher pressures which is yielding in a stronger modulated ion current towards the powered electrode.
Infrared laser absorption spectroscopy (IRLAS) employing both tuneable diode and quantum cascade lasers (TDLs, QCLs) has been applied with both high sensitivity and high time resolution to plasma diagnostics and trace gas measurements.
TDLAS combined with a conventional White type multiple pass cell was used to detect up to 13 constituent molecular species in low pressure Ar/H2/N2/O2 and Ar/CH4/N2/O2 microwave discharges, among them the main products such as H2O, NH3, NO and CO, HCN respectively. The hydroxyl radical has been measured in the mid infrared (MIR) spectral range in-situ in both plasmas yielding number densities of between 1011 ... 1012 cm-3. Strong indications of surface dominated formation of either NH3 or N2O and NO were found in the H2-N2-O2 system. In methane containing plasmas a transition between deposition and etching conditions and generally an incomplete oxidation of the precursor were observed.
The application of QCLs for IRLAS under low pressure conditions employing the most common tuning approaches has been investigated in detail. A new method of analysing absorption features quantitatively when the rapid passage effect is present is proposed. If power saturation is negligible, integrating the undisturbed half of the line profile yields accurate number densities without calibrating the system. By means of a time resolved analysis of individual chirped QCL pulses the main reasons for increased effective laser line widths could be identified. Apart from the well-known frequency down chirp non-linear absorption phenomena and bandwidth limitations of the detection system may significantly degrade the performance and accuracy of inter pulse spectrometers. The minimum analogue bandwidth of the entire system should normally not fall below 250 MHz.
QCLAS using pulsed lasers has been used for highly time resolved measurements in reactive plasmas for the first time enabling a time resolution down to about 100 ns to be achieved. A temperature increase of typically less than 50 K has been established for pulsed DC discharges containing Ar/N2 and traces of NO. The main NO production and depletion reactions have been identified from a comparison of model calculations and time resolved measurements in plasma pulses of up to 100 ms. Considerable NO struction is observed after 5 ... 10 ms due to the impact of N atoms.
Finally, thermoelectrically cooled pulsed and continuous wave (cw) QCLs have been employed for high finesse cavity absorption spectroscopy in the MIR. Cavity ring down spectroscopy (CRDS) has been performed with pulsed QCLs and was found to be limited by the intrinsic frequency chirp of the laser suppressing an efficient intensity build-up inside the cavity. Consequently the accuracy and advantage of an absolute internal absorption calibration is not achievable. A room temperature cw QCL was used in a complementary cavity enhanced absorption spectroscopy (CEAS) configuration which was equipped with different cavities of up to ~ 1.3 m length. This spectrometer yielded path lengths of up to 4 km and a noise equivalent absorption down to 4 x 10-8 cm-1Hz-1/2. The corresponding molecular concentration detection limit (e.g. for CH4, N2O and C2H2 at 1303 cm-1/7.66 μm) was generally below 1 x 1010 cm-3 for 1 s integration times and one order of magnitude less for 30 s integration times. The main limiting factor for achieving even higher sensitivity is the residual mode noise of the cavity. Employing a ~ 0.5 m long cavity the achieved sensitivity was good enough for the selective measurement of trace atmospheric constituents at 2.2 mbar.
(A paperback version is published by Logos under ISBN 978-3-8325-2345-9.)