81.15.-z Methods of deposition of films and coatings; film growth and epitaxy (for structure of thin films, see 68.55.-a; see also 85.40.Sz Deposition technology in microelectronics)
- 81.15.Aa Theory and models of film growth
- 81.15.Cd Deposition by sputtering (2)
- 81.15.Ef Vacuum deposition
- 81.15.Fg Laser deposition
- 81.15.Gh Chemical vapor deposition (including plasma-enhanced CVD, MOCVD, etc.) (for chemistry of MOCVD, see 82.33.Ya in physical chemistry and chemical physics)
- 81.15.Hi Molecular, atomic, ion, and chemical beam epitaxy
- 81.15.Jj Ion and electron beam-assisted deposition; ion plating (see also 52.77.Dq Plasma-based ion implantation and deposition in physics of plasmas)
- 81.15.Kk Vapor phase epitaxy; growth from vapor phase
- 81.15.Lm Liquid phase epitaxy; deposition from liquid phases (melts, solutions, and surface layers on liquids)
- 81.15.Np Solid phase epitaxy; growth from solid phases
- 81.15.Pq Electrodeposition, electroplating
- 81.15.Rs Spray coating techniques