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Ion formation in an argon and argon-oxygen gas mixture of a magnetron sputtering discharge
- Formation of singly and doubly charged Arq+ and Tiq+ (q = 1,2) and of molecular Ar 2 +, ArTi+, and Ti 2 + ions in a direct current magnetron sputtering discharge with a Ti cathode and argon as working gas was investigated with the help of energy-resolved mass spectrometry. Measured ion energy distributions consist of low-energy and high-energy components resembling different formation processes. Intensities of Ar 2 + and ArTi+ dimer ions strongly increase with increasing gas pressure. Addition of oxygen gas leads to the formation of positively charged O+, O2 +, and TiO+ and of negatively charged O− and O2 - ions.
Author: | Rainer Hippler, M Cada, V Stranak, Z Hubicka |
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URN: | urn:nbn:de:gbv:9-opus-58926 |
DOI: | https://doi.org/10.1088/2399-6528/ab1e82 |
ISSN: | 2399-6528 |
Parent Title (English): | Journal of Physics Communications |
Publisher: | IOP Publishing |
Place of publication: | Bristol |
Document Type: | Article |
Language: | English |
Date of first Publication: | 2019/05/20 |
Release Date: | 2022/11/11 |
Tag: | ion mass spectrometry; magnetron sputtering; molecular ion formation; negative ions |
GND Keyword: | - |
Volume: | 3 |
Issue: | 5 |
Article Number: | 055011 |
Page Number: | 9 |
Faculties: | Mathematisch-Naturwissenschaftliche Fakultät / Institut für Physik |
Licence (German): | Creative Commons - Namensnennung |