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Behavior of a porous particle in a radiofrequency plasma under pulsed argon ion beam bombardment
(2010)
The behavior of a single porous particle with a diameter of 250 μm levitating in a radiofrequency (RF) plasma under pulsed argon ion beam bombardment was investigated. The motion of the particle under the action of the ion beam was observed to be an oscillatory motion. The Fourier-analyzed motion is dominated by the excitation frequency of the pulsed ion beam and odd higher harmonics, which peak near the resonance frequency. The appearance of even harmonics is explained by a variation of the particles's charge depending on its position in the plasma sheath. The Fourier analysis also allows a discussion of neutral and ion forces. The particle's charge was derived and compared with theoretical estimates based on the orbital motion-limited (OML) model using also a numerical simulation of the RF discharge. The derived particle's charge is about 7–15 times larger than predicted by the theoretical models. This difference is attributed to the porous structure of the particle.
Surface Stoichiometry and Depth Profile of Tix-CuyNz Thin Films Deposited by Magnetron Sputtering
(2021)
Low-pressure plasmas offer a unique possibility of confinement, control and
fine tailoring of particle properties. Hence, dusty plasmas have grown
into a vast field and new applications of plasma-processed dust particles
are emerging. There is demand for particles with special properties and
for particle-seeded composite materials. For example, the stability of
luminophore particles could be improved by coating with protective Al2O3
films which are deposited by a PECVD process using a metal-organic precursor gas.
Alternatively, the interaction between plasma and injected micro-disperse powder
particles can also be used as a diagnostic tool for the study of plasma surface
processes. Two examples will be provided: the interaction of micro-sized (SiO2)
grains confined in a radiofrequency plasma with an external ion beam as well as
the effect of a dc-magnetron discharge on confined particles during deposition
have been investigated.
Copper tungsten oxide films are deposited with the help of reactive high power impulse magnetron sputtering (HiPIMS) in an argon/oxygen gas mixture. Two magnetrons, one equipped with a tungsten target and the other with a copper target, are employed. The HiPIMS discharge is operated with a repetition frequency of f=100 Hz. Pulse widths of 100 and 20 µs separated by 25 µs are chosen for the tungsten and copper target, respectively. Films deposited on two different glass substrates [soda lime glass and fluorine doped tin oxide (FTO) coated glass] are characterized by energy dispersive x-ray spectroscopy, x-ray photoelectron spectroscopy, x-ray diffraction, Raman spectroscopy, and ellipsometry. Photoelectrochemical activity was investigated by linear voltammetry. The composition and crystal structure of as-deposited and annealed films are found to depend on the deposition conditions. Annealed films deposited on FTO glass are composed of WO3 and CuWO4 or Cu2WO4 crystal phases. Films deposited on soda lime glass are subject to sodium diffusion into the films during annealing and the formation of Na2W2O7 and Na2W4O13 phases.
Abstract
Reactive high power impulse magnetron sputtering (HiPIMS) of a cobalt cathode in pure argon gas and with different oxygen admixtures was investigated by time-resolved optical emission spectroscopy (OES) and time-integrated energy-resolved mass spectrometry. The HiPIMS discharge was operated with a bipolar pulsed power supply capable of providing a large negative voltage with a typical pulse width of 100 μs followed by a long positive pulse with a pulse width of about 350 μs. The HiPIMS plasma in pure argon is dominated by Co+ ions. With the addition of oxygen, O+ ions become the second most prominent positive ion species. OES reveals the presence of Ar I, Co I, O I, and Ar II emission lines. The transition from an Ar+ to a Co+ ion sputtering discharge is inferred from time-resolved OES. The enhanced intensity of excited Ar+* ions is explained by simultaneous excitation and ionisation induced by energetic secondary electrons from the cathode. The intensity of violet Ar I lines is drastically reduced during HiPIMS. Intensity of near-infrared Ar I lines resumes during the positive pulse indicating an additional heating mechanism.
The pulse length dependence of a reactive high power impulse magnetron sputtering (HiPIMS) discharge with a tungsten cathode in an argon+oxygen gas mixture gas was investigated. The HiPIMS discharge is operated with a variable pulse length of 20–500 µs. Discharge current measurements, optical emission spectroscopy of neutral Ar, O, and W lines, and energy-resolved ion mass spectrometry are employed. A pronounced dependence of the discharge current on pulse length is noted while the initial discharge voltage is maintained constant. Energy-resolved mass spectrometry shows that the oxygen-to-tungsten (O+/W+) and the tungsten oxide-to-tungsten (WO+/W+) ion ratio decreases with pulse length due to target cleaning. Simulation results employing the SDTrimSP program show the formation of a non-stoichiometric sub-surface compound layer of oxygen which depends on the impinging ion composition and thus on the pulse length.
AbstractThe performance of a positively biased external ring anode in combination with a hollow cathode (HC) discharge or a magnetron sputtering (MS) discharge, both with a Ti cathode and with Ar as working gas, is investigated. Plasma and floating potential increase as function of anode voltage. Energy-resolved mass spectrometry reveals that the kinetic energy of argon and titanium ions is enhanced by a positive anode voltage allowing for an effective energy control of plasma ions.
A hollow cathode discharge with a Ti cathode and a positively biased ring anode was operated in Ar + N2 or Ar + O2 gas mixtures. The energy distribution of plasma ions is investigated with the help of energy-resolved mass spectrometry. Singly and doubly charged Ar+ and Ar2+ ions and molecular N+2 or O+2 ions are the most abundant ionic species. The kinetic energy of all plasma ions is enhanced by a positive anode voltage.
Formation of singly and doubly charged Arq+ and Tiq+ (q = 1,2) and of molecular Ar 2 +, ArTi+, and Ti 2 + ions in a direct current magnetron sputtering discharge with a Ti cathode and argon as working gas was investigated with the help of energy-resolved mass spectrometry. Measured ion energy distributions consist of low-energy and high-energy components resembling different formation processes. Intensities of Ar 2 + and ArTi+ dimer ions strongly increase with increasing gas pressure. Addition of oxygen gas leads to the formation of positively charged O+, O2 +, and TiO+ and of negatively charged O− and O2 - ions.