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Abstract
We propose a setup enabling electron energy loss spectroscopy to determine the density of the electrons accumulated by an electropositive dielectric in contact with a plasma. It is based on a two-layer structure inserted into a recess of the wall. Consisting of a plasma-facing film made out of the dielectric of interest and a substrate layer, the structure is designed to confine the plasma-induced surplus electrons to the region of the film. The charge fluctuations they give rise to can then be read out from the backside of the substrate by near specular electron reflection. To obtain in this scattering geometry a strong charge-sensitive reflection maximum due to the surplus electrons, the film has to be most probably pre-n-doped and sufficiently thin with the mechanical stability maintained by the substrate. Taking electronegative CaO as a substrate layer we demonstrate the feasibility of the proposal by calculating the loss spectra for Al2O3, SiO2, and ZnO films. In all three cases we find a reflection maximum strongly shifting with the density of the surplus electrons and suggest to use it for charge diagnostics.
Formation of singly and doubly charged Arq+ and Tiq+ (q = 1,2) and of molecular Ar 2 +, ArTi+, and Ti 2 + ions in a direct current magnetron sputtering discharge with a Ti cathode and argon as working gas was investigated with the help of energy-resolved mass spectrometry. Measured ion energy distributions consist of low-energy and high-energy components resembling different formation processes. Intensities of Ar 2 + and ArTi+ dimer ions strongly increase with increasing gas pressure. Addition of oxygen gas leads to the formation of positively charged O+, O2 +, and TiO+ and of negatively charged O− and O2 - ions.
Abstract
Reactive high power impulse magnetron sputtering (HiPIMS) of a cobalt cathode in pure argon gas and with different oxygen admixtures was investigated by time-resolved optical emission spectroscopy (OES) and time-integrated energy-resolved mass spectrometry. The HiPIMS discharge was operated with a bipolar pulsed power supply capable of providing a large negative voltage with a typical pulse width of 100 μs followed by a long positive pulse with a pulse width of about 350 μs. The HiPIMS plasma in pure argon is dominated by Co+ ions. With the addition of oxygen, O+ ions become the second most prominent positive ion species. OES reveals the presence of Ar I, Co I, O I, and Ar II emission lines. The transition from an Ar+ to a Co+ ion sputtering discharge is inferred from time-resolved OES. The enhanced intensity of excited Ar+* ions is explained by simultaneous excitation and ionisation induced by energetic secondary electrons from the cathode. The intensity of violet Ar I lines is drastically reduced during HiPIMS. Intensity of near-infrared Ar I lines resumes during the positive pulse indicating an additional heating mechanism.