52.20.-j Elementary processes in plasmas
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The concept of the electron surface layer introduced in this thesis provides a framework for the description of the microphysics of the surplus electrons immediately at the wall and thereby complements the modelling of the plasma sheath. In this work we have considered from a surface physics perspective the distribution and build-up of an electron adsorbate on the wall as well as the effect of the negative charge on the scattering of light by a spherical particle immersed in a plasma. In our electron surface layer model we treat the wall-bound electrons as a wall-thermalised electron distribution minimising the grand canonical potential and satisfying Poissons equation. The boundary between the electron surface layer and the plasma sheath is determined by a force balance between the attractive image potential and the repulsive sheath potential and lies in front of the crystallographic interface. Depending on the electron affinity x, that is the offset of the conduction band minimum to the potential in front of the surface, two scenarios for the wall-bound electrons are realised. For x<0 electrons do not penetrate into the solid but are trapped in the image states in front of the surface where they form a quasi two-dimensional electron gas. For x>0 electrons penetrate into the conduction band where they form an extended space charge. These different scenarios are also reflected in the electron kinetics at the wall which control the sticking coefficient and the desorption time. If x<0 electrons from the plasma cannot penetrate into the solid. They are trapped in the image states in front of the surface. The transitions between unbound and bound states are due to surface vibrations. Trapping of electrons is mediated by one-phonon transitions and takes place in the upper bound states. Owing to the large binding energy of the lowest bound state transitions from the upper bound states to the lowest bound state are due to multi-phonon processes. For low surface temperatures relaxation to the lowest bound state takes place while for higher temperature a relaxation bottleneck emerges. Desorption occurs in cascades for systems without relaxation bottleneck and as a one-way process in systems with a relaxation bottleneck. From the perspective of plasma physics the most important result is that the sticking coefficient for electrons is relatively small, typically on the order of 0.001. For x>0 electron physisorption takes place in the conduction band. For this case sticking coefficients and desorption times have not been calculated yet but in view of the more efficient scattering with bulk phonons, responsible for electron energy relaxation in this case, we expect them to be larger than for the case of x<0. Finally, we have studied the effects of surplus electrons on the scattering of light by a spherical particle. For x<0 the electrons form a spherical electron gas around the particle and their electrical conductivity modifies the boundary condition for the magnetic field. For x>0 the electrons in the bulk of the particle modify the refractive index through their bulk electrical conductivity. In both cases the conductivity is limited by scattering with surface or bulk phonons. Surplus electrons lead to an increase of absorption at low frequencies and, most notably, to a blue-shift of an extinction resonance in the infrared. This shift is proportional to the charge and is strongest for submicron-sized particles. The particle charge is also revealed in a blue-shift of the rapid variation of one of the two polarisation angles of the reflected light. From our work we conclude that the electron affinity is an important parameter of the surface which should affect the charge distribution as well as the charge-up. Therefore, we encourage experimentalists to study the charging of surfaces or dust particles as a function of x. Interesting in this respect is also if or under what conditions the electron affinity of a surface exposed to a plasma remains stable. Moreover, we suggest to use the charge signatures in Mie scattering to measure the particle charge optically. This would allow a charge measurement independent of the plasma parameters and could be applied to nano-dust where conventional methods cannot be applied.
Asymmetrical capacitively coupled RF discharges in oxygen, argon and hydrogen have been experimentally investigated with the innovative technique of the phase resolved optical emission spectroscopy. This diagnostic tool allows to measure spatio-temporally resolved emission intensities of electronically excited species with a high resolution. The spatial (axial) resolution was better than 1 mm and a temporal resolution of about 1.5 ns has been achieved. Therefore the plasma induced optical emission within the RF cycle (TRF = 73.75 ns) from the RF sheath region with a typical mean sheath thickness of about 5mm has been studied. Spatio-temporally resolved optical emission patterns of the following optical transitions have been measured for a total gas pressure in the range of 20 to 100 Pa and self-bias voltages between -50 and -550 V: Oxygen plasma Emission at 777.4 nm and 844.6 nm (atomic oxygen) Argon plasma Emission at about 751 nm and 841 nm (argon) Hydrogen plasma Emission at 656.3nm (atomic hydrogen, H alpha-line) These transitions are the most prominent ones of the investigated excited species in these plasmas as could be shown from overview spectra of the plasma induced optical emission in the range from 350 to 850 nm. For the first time such extensive PROES measurements in oxygen CCRF plasmas are presented in this work. The additional investigations of argon and hydrogen plasmas serve as a reference and for a direct comparison with results from the literature. The temporal behavior of the emission intensity is influenced by the effective lifetime of the emitting states which is on the order of the nanosecond time scale of the RF cycle. Therefore, it does not represent the real temporal behavior of the excitation. A simple method has been applied to calculate relative excitation rates from the measured emission intensities to distinguish different excitation mechanisms and their correct relative temporal behavior. In a close collaboration within the framework of the Sonderforschungsbereich Transregio 24 'Fundamentals of Complex Plasmas' a newly 1d3v PIC-MCC code for simulations of capacitive RF discharges in oxygen has been developed by Matyash et al. The very close coupling of experiment and modeling allowed a really detailed and microscopic understanding of the processes and dynamics from the sheath to the bulk plasma in CCRF discharges. The spatio-temporally resolved excitation rate profiles show four different excitation structures (I-IV). Excitation processes due to the following mechanisms in CCPs could be identified and characterized: I Electrons expelled from growing sheath II Electrons detached from negative ions (collisions with neutrals) + secondary electrons from the electrode surface (ion bombardment) III Field-reversal effect, reduced mobility of electrons (electron-neutral collisions) IV Heavy-particle collisions These excitation mechanisms are characterized by different temporal and spatial behaviors of the excitation rate within the RF cycle. Additionally it has been shown that the excitation by electron impact in the investigated oxygen plasmas results mainly from dissociative electron impact excitation (O2 + e -> O + O* + e) and not from direct electron impact excitation (O + e -> O* + e). Actinometry measurements show that the results are not really credible. Thus actinometry is not applicable on the investigated oxygen RF plasma. A challenge in interpretation is the observed excitation pattern IV. Pattern IV has to be caused in connection with heavy particle collisions nearby the electrode surface and could be observed in all the three plasmas oxygen, argon and hydrogen. It is located directly in front of the powered electrode and appears during almost the whole RF cycle. The temporal modulation is nearly sinusoidal and weak in comparison to the first three patterns. This is due to the weak RF modulation of the ion flux towards the electrode surface which has been proven by a PIC simulation. It could be shown that the modulation degree of pattern IV depends on the transition time of the corresponding positive ions through the RF sheath which is influenced by the ion mass. In oxygen as well as in argon CCRF plasmas pattern IV is less modulated than in hydrogen CCRF plasmas due to the heavier ions in oxygen and argon. Additionally the modulation degree increases with increasing pressure due to the more confined plasma at higher pressures which is yielding in a stronger modulated ion current towards the powered electrode.